Sentaurus Lithography
Synopsys, Inc.
Sentaurus Lithography covers a wide range of applications in optical, immersion, extreme ultraviolet (EUV) and electron beam (e-beam) lithography, allowing predictive modeling and thorough analysis of fundamental effects. The simulator covers a wide range of applications in optical, immersion, extreme ultraviolet (EUV) and electron beam (e-beam) lithography, allowing predictive modeling and thorough analysis of fundamental effects. The integration of Sentaurus Lithography with Sentaurus Topography allows seamless modeling of complex technologies such as double patterning. The interfaces of Sentaurus Lithography to Synopsys applications in the area of design and mask synthesis accelerate the generation of OPC models, minimizing process variability.
Industry
Red Hat Certifications
This product has been certified to run on the following Red Hat products and technologies:
| Target Product | Level |
|---|---|
| Red Hat Enterprise Linux 6.x | Self-Certified |
