EXACT Interconnect Parasitic Characterization
Silvaco Data Systems Inc.
EXACT Interconnect Parasitic Characterization delivers the most accurate interconnect models for nanometer semiconductor processes and generates layout parameter extraction (LPE) rule files for leading full chip extraction tools. EXACT's powerful 3D field solvers support Mentor xCalibre™ and Calibre xRC™, Cadence DIVA™ and Dracula™ LPE, and Simucad HIPEX Full Chip Parasitic Extraction products. Key Features Powerful 3D solver supports non-planar semiconductor profiles for accurately modeling irregular etch profiles, dual damascene, and low-K dielectrics 3D field solver calculates interconnect capacitance models to deliver highest accuracy LPE rule files without compromising extraction performance Intuitive and user-friendly graphical interface for process layer description and test structure definition for beginner and experienced process technology developers Standard mode of operation handles most conventional processes whereas advanced mode can be used for more complex and non-planar process definition Integrated scripting language provides custom LPE rule files for other extraction tools Powerful statistical analysis module option available to calculate variations of capacitance using known process margins to account for interconnect process variation
Industry
Red Hat Certifications
This product has been certified to run on the following Red Hat products and technologies:
| Target Product | Level |
|---|---|
| Red Hat Enterprise Linux 5.x | Self-Certified |
| Red Hat Enterprise Linux 6.x | Self-Certified |
