< Back to list

Cats

CATS® is a highly scalable and flexible software application that transcribes complex design data into machine readable instructions for e-beam and laser machines used for the pattern generation and manufacturing of IC, MEMS, TFT-LCD, TFH, photonics, and biochip products. CATS has installations in virtually every photomask manufacturing facility worldwide, and is the de facto standard for mask manufacturing, inspection, metrology, and direct-write-on-wafer.

Industry

Environment Industrial R&D

Red Hat Certifications

This product has been certified to run on the following Red Hat products and technologies:

Target Product Level
Red Hat Enterprise Linux 5.x Self-Certified
Red Hat Enterprise Linux 6.x Self-Certified